The latest generation of RF generators
The decisive factor in coating or structuring surfaces is a stable and reproducible plasma current supply. RF generators of the TruPlasma RF Series 1000 / 3000 (G2/13) offer the best conditions for this with their state-of-the-art power electronics. Their stable output power and high control accuracy guarantee the best results while maintaining high levels of productivity.
CombineLine technology: Optimal process power due to true 50 ohm output impedance.
Adjusting the cable lengths is no longer necessary – an absolute innovation in the RF area.
CombineLine technology: Reliable protection against reflected power in the event of mismatch.
Efficiency of up to 80% enables energy costs to be decreased by up to 50%.
No heating or contamination of the ambient air, meaning operation in clean rooms is also possible.
Ideal for the coating of flat screens
TruPlasma Series RF 1000 / 3000 (G2/13) RF generators are perfectly suited for plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and RF sputtering. These processes are used, among other things, for manufacturing semi-conductor components and micro-electromechanical systems (MEMS) as well as for coating flat screens and solar cells.
Typical area of application: The solar industry
Typical areas of application for the TruPlasma RF Series 1000 / 3000 (G2/13) include demanding PECVD, etching, and RF sputtering processes in the solar industry.
Semi-conductor production
Various plasma processes are used to manufacture semi-conductors, from removal processes such as dry etching to zone refining in the production of pure silicon. The TruPlasma RF Series 1000 / 3000 (G2/13) generators offer all of the conditions for a power supply that is stable and optimally adjusted to the respective process, ensuring that you achieve excellent, reproducible results.
Optimal adjustment to your process
Intelligent real-time matching of the TruPlasma RF Series 1000 / 3000 (G2/13) ensures fast and direct adjustment of the impedance to 50 ohms. The CombineLine technology reliably prevents plasma fluctuations and impurities; the blower-free cooling concept reduces the failure occurrence rate, while improving efficiency and enabling use in a clean room.
Maximum efficiency and flexibility
With maximum efficiencies of up to 80%, you can reduce your energy costs by up to 50%, compared with conventional generators. Numerous available interfaces (configurable analog interface, RS 232/485, DeviceNet, Profibus, EtherCAT) facilitate integration in existing systems; technical adjustments are not required due to the integrated ultra-wide range power packs (200-480 VAC). The high-power but nevertheless compact design (19-inch or ½-19-inch plug-in unit) enables space-saving integration into any production system.
TRUMPF SystemPort
SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.
Various options allow optimal adjustment of the RF generator to your application.
The patented Auto Frequency Tuning solution enables simultaneous and fast frequency tuning and guarantees the optimal interaction between the generator and matchbox. Due to this patented technology, a local minimum is no longer an obstacle: The RF system is optimized and the best process results and a high level of reproducibility are guaranteed.
The well-grounded arc management is the ideal module for optimized plasma process control. Targeted arc detection guarantees the highest productivity possible, while protecting the product and the system at the same time.
All components of the TRUMPF RF System are perfectly matched.
Perfectly matched: The TRUMPF RF System
Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.
This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.
