The challenge:
High deposition rates and excellent layer qualities - these are crucial quality requirements in plasma-assisted recoating processes such as in the production of solar cells or the coating of flat screen monitors. Plasma coatings can however be disrupted by electrical sparkovers or arc discharges as they are known. The power supply being used therefore needs to detect and react to an arc in the quickest possible time.The solution:
Our plasma generators are equipped with an arc management system tailored to individual needs. These allow extremely quick arc detection, allowing the generator to react to arcs rapidly and with precision. Arcs are managed by briefly switching off the output power thereby discharging the arc. On restarting the generator, a check is made for correct burning of the glow discharge.
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Products
MF Plasma Excitation
MF plasma excitation from TRUMPF Hüttinger is mainly used in dual-cathode systems, for example for dual magnetron sputtering.
DC Pulsed Plasma Excitation
DC pulsed plasma excitation from TRUMPF Hüttinger is ideal for use in numerous reactive processes.
DC Plasma Excitation
Direct current generators from TRUMPF Hüttinger are classics when it comes to DC plasma excitation.
RF Plasma Excitation
TruPlasma RF generators from TRUMPF Hüttinger offer the highest process stability of all power supplies for plasma excitation applications.
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