Plasma excitation

TruPlasma VHF Series 3000

Meeting every need

Innovative, modular, scalable: the new generator platform from TRUMPF Hüttinger

The TruPlasma VHF Series 3000 generators are based on an innovative platform concept that enables the highest level of power density and meets the most demanding process requirements. The modular and purely water-cooled construction enables the output power to be scaled to up to 80 kW. These compact VHF generators are also very cost-effective and have a robust design.

Precise and fast arbitrary pulse shapes

This provides the best plasma process control for the present single and multi-level pulsing.

Minimal ramp time < 150 ns

This means extremely flexible control of the generator ignition behavior is possible.

Smart auto frequency tuning

Automatic frequency tuning for optimal interaction between the generator and the matchbox.

Reliable and sophisticated process control

Excellent, reproducible process results due to highly precise digital frequency modulation.

Independent of cable length

The length of the RF cable does not need to be adapted when the process is changed, resulting in short setup times.

Robust design

Reliable generator function even in the event of mismatch due to CombineLine technology.

Production of photovoltaic cells

There are numerous areas of application for tailored process energy in the photovoltaic field. Here, various plasma processes are used to add and remove materials, such as sputtering, PECVD and etching. The TruPlasma VHF Series 3000 generators can be adapted optimally to the respective process, with fast arc management allowing for stable control of the plasma. As a result, excellent process results and high productivity are guaranteed.

Semi-conductor production

Various plasma processes are used to manufacture semi-conductors, from removal processes such as dry etching to zone refining in the production of pure silicon. TruPlasma VHF Series 3000 generators offer all of the conditions for a power supply that is stable and optimally adjusted to the respective process, ensuring that you achieve excellent, reproducible results.

Ideal for the coating of flat screens

The TruPlasma VHF Series 3000 generators are perfectly suited for plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and RF sputtering. These processes are used, among other things, for manufacturing semi-conductor components and micro-electromechanical systems (MEMS) as well as for coating flat screens and solar cells.

Flexible adaptation to the process

The modular platform concept of the TruPlasma VHF Series 3000 enables the output power to be scaled to up to 80 kW. With CombineLine technology, the generator is also very robust, even in the event of a mismatch. Its wide frequency range, variable line voltage, and cable length mean it can be adjusted for use in various applications and countries.

Extremely efficient and cost-effective

TruPlasma VHF Series 3000 RF generators are built with the latest semi-conductor technology with LDMOS power transistors. The highly integrated planar technology enables the highest power density level with high energy efficiency, and a correspondingly reduced need for cooling capacity. As a result, this family offers unparalleled cost-effectiveness in this frequency range and reduces common operating costs.

TRUMPF SystemPort

SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.

Various options enable optimal adjustment of the VHF generator to your application.

Arc management

The well-grounded arc management is the ideal module for optimized plasma process control. Targeted arc detection guarantees the highest productivity possible, while protecting the product and your system at the same time.

Flexible pulse shapes

Flexible pulse shapes: the shape of the output signal can be adjusted to meet any process requirement.

Smart auto frequency tuning

The patented Auto Frequency Tuning solution enables simultaneous and fast frequency tuning and guarantees the optimal interaction between the generator and matchbox. Due to this patented technology, a local minimum is no longer an obstacle: The RF system is optimized and the best process results and a high level of reproducibility are guaranteed.

TruControl Power

The user-friendly TruControl Power, control software, enables the convenient start-up and secure monitoring of the RF generator or the entire TRUMPF RF system during current processes.

By selecting suitable system components, you can perfectly adjust the VHF generator to your application requirements.

Matchbox

TruPlasma Match matchboxes ensure an optimal transfer of power from the generator to the plasma discharge. The matchbox can be operated independently or via an intelligent generator/matchbox connection, the so-called SystemPort.

Accessory kit

This is comprised of an adapter for water connections, a HARTING AC supply set, a jumper for the the interlock function, and an adapter from LEMO EPL to BNC female (for clock and pulse sync plugs).

Master oscillators

Master oscillators can be used to stabilize and optimize critical synchronous plasma processes. An integrated, digital frequency and phase synthesizer ensures excellent frequency and phase stability and supports the adjustment of the phase position with a very small increment. Various master oscillator designs for the frequency 13.56 MHz as well as different frequency combinations are available.

RF switch

An RF switch supports the multiple use of an RF generator at various plasma process stations, for example, for providing power to sequential processes, or on systems with various feed points. Various RF switches are available in two power classes and with 2, 3, or 4 outputs.

Coaxial cable

TRUMPF Hüttinger offers coaxial cables that are specifically designed for operation in 50-ohm systems for RF power transmission.

Perfectly matched: The TRUMPF RF System

Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.

This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.

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PDF - 774 KB

LDMOS

This paper explores the effects of performance combining structures on the RF and thermal performance of RF high-power amplifiers under incongruent conditions.

PDF - 845 KB

Precision in processing

Continuous improvements to the semiconductor production process are required to ensure a continuous reduction in size. This in turn requires TF generators that have an ever-higher signal quality in relation to output power and time resolution.

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Perfectly suited for the coating of large areas

Power supplies for your plasma process

Plasma generators from TRUMPF Hüttinger have a broad power and frequency spectrum. Find out about our products here.

RF-Systemlösung : Matchbox für höchste Prozessstabilität

Intelligent matching through real-time measurement

The new TruPlasma Match Series 1000 (G2/13) matchboxes are ideal additions to our RF generators and help to provide a comprehensive solution: the TRUMPF RF system.

Service & contact

Contact

Ehab Alhawari

Sales TRUMPF Hüttinger

Phone +49 761 89712115

Services

Downloads

TruPlasma RF System brochure

pdf - 6 MB

TruPlasma VHF Series 3000

pdf - 7 MB