RF system solution from a single source
The new TruPlasma Match Series 1000 (G2/13) matchboxes represent the ideal complement to RF generators from TRUMPF Hüttinger. Their intelligent matching algorithm and digital control platform for process monitoring provide a comprehensive solution in which all of the components work together optimally – the TRUMPF RF system.
Fast, stable, and reproducible impedance matching to 50 ohms, even in critical processes.
Progressive software and improved communication between the generator and matchbox.
Fast system tracking for every change in the impedance of the matchbox and the load.
Optimal monitoring of the process parameters as well as early arc detection.
Graphical user interface and effective tools (Smith diagram, real-time oscilloscope).
Production of semi-conductors, photovoltaic cells, and flat screens
Stable plasma processes are crucial during the production of semi-conductors, photovoltaic cells, and flat screens. In conjunction with TRUMPF Hüttinger RF generators, the TruPlasma Match Series 1000 (G2/13) matchboxes offer a comprehensive solution for the highest process stability and productivity.
Application of hard material and wear-resistant coatings
The application of functional coats gives heavy-duty workpieces increased mechanical hardness as well as better thermal and chemical stability. In conjunction with an RF generator from TRUMPF Hüttinger, TruPlasma Match Series 1000 (G2/13) matchboxes ensure perfect coating quality.
Ablation and coating of surfaces
TruPlasma Match Series 1000 (G2/13) matchboxes can be used in all standard plasma processes to coat or ablate surfaces – such as plasma etching, reactive ion etching, ALD, PECVD, RF sputtering, and photoresist plasma ashing. When combined with a TRUMPF Hüttinger RF generator it provides optimal process results.
Perfect process control at all times
The matchbox ensures fast and direct impedance adjustment to 50 ohms at all times – thus guaranteeing the full power output of the RF generator in the process. The seamless communication between the matchbox and the generator enables optimal process monitoring and early arc detection.
All parameters at a glance
The real time measurement of RF input and output power indicates dynamic impedance changes, and cooling sensors enable a reliable prediction of power loss. With the graphical operating software with complex display options (Smith chart, real time oscilloscope), you have an overview all of the relevant process parameters.
TRUMPF SystemPort
SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.
Highly accurate AC current metering to detect plasma anomalies, placed in the matchbox close to the process, directly at the chamber.
Analog/digital, PROFIBUS, and EtherCAT are available as optional interfaces. The standard interfaces are EtherNet, SystemPort, and RS232/485.
The well-grounded arc management is the ideal module for optimized plasma process control. Targeted arc detection guarantees the highest productivity possible, while protecting the product and the system at the same time.
Graphical operating software
Complex graphical depictions enable comprehensive control of all relevant process parameters. Load and matchbox impedance are visualized using a Smith diagram, the RF input and output power, including frequency and phase position, with the help of a real time oscilloscope.
TruControl Power
The user-friendly TruControl Power, control software, enables the convenient start-up and secure monitoring of the RF generator or the entire TRUMPF RF system during processing.
Complex graphical depictions enable comprehensive control of all relevant process parameters. Load and matchbox impedance are visualized using a Smith diagram, the RF input and output power, including frequency and phase position, with the help of a real time oscilloscope.
Master oscillators can be used to stabilize and optimize critical synchronous plasma processes. An integrated, digital frequency and phase synthesizer ensures excellent frequency and phase stability and supports the adjustment of the phase position with a very small increment. Various master oscillator designs for the frequency 13.56 MHz as well as different frequency combinations are available.
An RF switch supports the multiple use of an RF generator at various plasma process stations, for example, for providing power to sequential processes, or on systems with various feed points. Various RF switches are available in two power classes and with 2, 3, or 4 outputs.
TRUMPF Hüttinger offers coaxial cables that are specifically designed for operation in 50-ohm systems for RF power transmission.
Optimal control of the plasma process
Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.
This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.
