Reflected in the media: EUV lithography

Dieser Bericht des Handelsblatts ist anlässlich der im Mai 2019 veranstalteten, gemeinsamen Pressereise von TRUMPF, Zeiss und ASML entstanden. Die Autoren beleuchten die Zusammenarbeit der Partner, zeichnen die Entwicklung von EUV nach und geben mit Zitaten, unter anderem von Peter Leibinger, Chief Technologie Officer bei TRUMPF, Einblicke in das Potenzial der Zukunftstechnologie.

Quelle: Handelsblatt
Autor: Martin-W. Buchenau, Joachim Hofer
Erscheinungsdatum: 05/2019
Link: zum Artikel

Die News auf optics.org berichtet, dass trotz zunehmender, makroökonomischer Unsicherheiten die Nachfrage nach Lithografiesystemen von ASML konstant bleibt. Schlüsselkunden wie Samsung und TSMC geben ihre Pläne für den Einsatz von EUV-Systemen in der zukünftigen Produktion von Chips bekannt. Diese werden für neue Anwendungen in den Bereichen 5G, künstliche Intelligenz, Hochleistungsrechnen und Automotive dringend gebraucht – wie Charlie Bae von Samsung schon lange vorhergesagt hat.

Quelle: www.optics.org
Autor: n.N.
Erscheinungsdatum: 04/2019
Link: zum Artikel

In this Golem.de article, author Marc Sauter reports that Samsung Foundry has completed  development on the 5-nm process technology with extreme ultra-violet radiation (EUV), and will be accepting customer orders immediately. This new process allows a 25% increase in transistor density, while the chips exhibit a power input that is 20% lower, and a processing power that is 10% higher.

Source: www.golem.de
Author: Marc Sauter
Date of publication: 04/2019
Link: to article

In this article, Heise.de reports that in autumn 2018, Samsung started production in its first factory dedicated to 7 nm, where it exposes wafers with the EUV lithography system from ASML. Source: www.heise.de
Author: Nico Ernst
Date of publication: 10/2018
Link: to article

The TRUMPF 2017/2018 annual report highlights how controlling light – and, with that, lasers and EUV lithography – lays the foundation for future technologies such as artificial intelligence, autonomous driving and networked factories.

Source: TRUMPF annual report for fiscal year 2017/2018
Author: TRUMPF GmbH + Co. KG
Date of publication: 10/2018
Link: to article

This golem.de article announces that ASML has improved its NXW:3400B systems so significantly that cost and time-efficient series production using extreme ultraviolet radiation is within reach. Source: www.golem.de
Author: Marc Sauter
Date of publication: 07/2018
Link: to article

In this article, LaserFocusWorld traces the development of EUV technology, which spans a period of more than two decades, and explores the numerous hurdles and challenges that had to be overcome before the breakthrough in 2015.

Source: LaserFocusWorld
Author: Andreas Thoss
Date of publication: 11/2017
Link: to article

This report in the trade publication "Produktion" concerns TRUMPF's majority takeover of Access. As the manufacturer of low-power CO₂ lasers, Access Laser is one of the most important partners in TRUMPF's EUV business. Source: www.optics.org
Author: anonymous
Date of publication: 10/2017
Link: to article

The "Stuttgarter Zeitung" newspaper reports how TRUMPF, with its laser amplifier, has entered the semi-conductor industry as a supplier and founded a new subsidiary for the business. Source: Stuttgarter Zeitung
Author: Michael Heller
Date of publication: 05/2017
Link: to article

This article in weekly electronics magazine, "Markt&Technik", summarises ASML's current and planned turnover and sales volume, both of which prove that EUV lithography has finally arrived on the industrial stage. Source: Markt&Technik
Author: Heinz Arnold
Date of publication: 07/2017
Link: to article